Etching solution for forming an embedded resistor
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United States of America Patent
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Jan 11, 2005
Grant Date -
Aug 14, 2003
app pub date -
Feb 11, 2002
filing date -
Feb 11, 2002
priority date (Note) -
Expired
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Abstract
A resistive etching solution containing thiourea, which is particularly suitable for etching an electrically resistive material comprised of a nickel-chromium alloy. The resistive etching solution allows for fast and effective etching of a nickel-chromium alloy in cases where the ratio of (a) copper surface area to (b) nickel/chromium surface area, is relatively large, and where fine feature etching is desired.
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