Substrate processing apparatus and substrate processing method
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United States of America Patent
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Jan 11, 2005
Grant Date -
Feb 13, 2003
app pub date -
Aug 7, 2002
filing date -
Aug 8, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A substrate processing apparatus for processing a substrate coated with a chemical amplification type resist and subjected to a light-exposure treatment comprises a substrate table on which is disposed a substrate, a heater for heating the substrate disposed on the substrate table, and an electric field forming mechanism for forming an electric field exerting force, which is directed toward the substrate, on the protons generated in the resist formed on the substrate disposed on the substrate table.
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