Monitoring apparatus and method particularly useful in photolithographically processing substrates
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 11, 2005
Issued Date -
N/A
app pub date -
Dec 6, 2000
filing date -
Jul 14, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for in process monitoring of the parameters of a substrate undergoing a processing within a photolithography tools arrangement which includes substrate loading and unloading stations, and substrate coating, exposure and developing stations. The method includes the step of supplying the substrate after being developed to a monitoring station and analyzing the monitoring data to estimate the photolithography process to be used for controlling thereof.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully