Exposure apparatus, microdevice, photomask, method of exposure, and method of production of device
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United States of America Patent
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Jan 11, 2005
Grant Date -
N/A
app pub date -
Jan 8, 2002
filing date -
May 7, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
A stitching type exposure apparatus for successively exposing an image of a pattern of a reticle (Ri) on different areas of a surface of a substrate (4) while overlaying parts of the same, wherein a density filter (Fj) having a light attenuating part for reducing the amount of light of overlaid parts of the image of the pattern in a sloping manner is provided in the vicinity of the reticle (Ri), the density filter (Fj) is held at a filter stage (FS) for adjusting the posture, the posture of the density filter (Fj) is detected by an illumination uniformity sensor (126) on the substrate stage (6), and the posture of the density filter (Fj) is matched with the posture of the reticle (Ri) by the filter stage (FS).
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