Imprint lithography template comprising alignment marks
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United States of America Patent
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-
Jan 11, 2005
Grant Date -
Jul 22, 2004
app pub date -
Dec 29, 2003
filing date -
Jul 16, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
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