Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Feb 1, 2005
Grant Date -
Dec 6, 2001
app pub date -
Nov 30, 2000
filing date -
May 30, 2000
priority date (Note) -
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Abstract
A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.
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