Apparatus and method for pre-conditioning a conditioning disc
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United States of America Patent
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Feb 22, 2005
Grant Date -
N/A
app pub date -
Jan 11, 2000
filing date -
Jan 11, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus and a method for off-line pre-conditioning a conditioning disc that is used in a chemical mechanical polishing process are provided. In the apparatus, an upper platform for mounting a conditioning disc thereto and a lower platform for mounting a polishing pad thereto are engaged together under a pre-set pressure and rotated in opposite directions for a pre-set length of time. The apparatus is effective in removing loose particles from the surface of the conditioning disc such that the possibility of any such particles causing scratches on a wafer surface during a subsequently conducted chemical mechanical polishing process is eliminated. The present invention novel apparatus can be used off-line for pre-conditioning a conditioning disc such that valuable machine time of a chemical mechanical polishing apparatus is not wasted.
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