Apparatus and method for semiconductor wafer cleaning
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United States of America Patent
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Feb 22, 2005
Issued Date -
N/A
app pub date -
Dec 23, 2003
filing date -
Oct 29, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An improved method for removing contaminant particles from a surface of a semiconductor wafer includes forming a sacrificial film on the surface of the wafer and then removing the sacrificial film by supercritical fluid cleaning. The removal of the sacrificial film via the supercritical fluid cleaning process facilitates removing the contaminant particles. The method further includes identifying and characterizing the contaminant particles and creating a record of the contaminant particle data. The composition of the sacrificial film is selected based on the contaminant particles data and the supercritical cleaning recipe is selected based on the composition of the sacrificial film and the contaminant particles data.
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