Mask set for compensating a misalignment between patterns and method of compensating a misalignment between patterns using the same
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United States of America Patent
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Mar 15, 2005
Grant Date -
Jul 22, 2004
app pub date -
Jan 5, 2004
filing date -
Dec 16, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention discloses a mask set for compensating for a misalignment between the patterns and method of compensating for a misalignment between the patterns. A mask set of the present invention comprises a first mask consisted of a mask substrate on which a main pattern and a plurality of sub-patterns are formed, said sub-patterns formed at a side of the main pattern; a second mask consisted of a mask substrate on which a plurality of hole patterns are formed, the hole patterns corresponded to spaces between the main pattern and the sub-patterns of the first mask, respectively when the first and second mask are overlapped to each other; and a third mask consisted of mask substrate on which a plurality of bar patterns are formed, the bar patterns corresponded to the hole patterns of the second mask, respectively when the second and third mask are overlapped to each other.
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