Simultaneous cyclical deposition in different processing regions
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United States of America Patent
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Apr 5, 2005
Grant Date -
Oct 9, 2003
app pub date -
Apr 9, 2002
filing date -
Apr 9, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.
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