High frequency sputtering device

United States of America Patent

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Apr 12, 2005
Grant Date
Dec 20, 2001
app pub date
May 31, 2001
filing date
Jun 16, 2000

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Abstract

The stray capacitance between the target and grounding member and the loss of high frequency electric current are reduced by arranging dielectric members and metal members with a particular configuration at the circumference of the cathode and target.

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Patent Owner(s)

Patent Owner	Address
ANELVA CORPORATION	8-1 YOTSUYA 5-CHOME FUCHU-SHI TOKYO

International Classification(s)

C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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Inventor Name	Address	# of filed Patents	Total Citations
Hasegawa, Shinya	Tokyo, JP	161	1308
Kouyama, Yuka	Tokyo, JP	1	49
Numazawa, Yoichi	Tokyo, JP	1	49

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High frequency sputtering device

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United States of America Patent

09867383

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PATENT NO	6878249
APP PUB NO	20010052458A1
SERIAL NO	09867383
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 12, 2005	US,6878249,B2 US6878249B2	GRANTED PATENT AS SECOND PUBLICATION
December 20, 2001	US,20010052458,A1 US20010052458A1	FIRST PUBLISHED PATENT APPLICATION

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09867383

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