Analytical element and measuring device and substrate quantification method using the same
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United States of America Patent
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Apr 12, 2005
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app pub date -
Aug 13, 2002
filing date -
Dec 13, 2000
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Abstract
The present invention provides an analytical element which is free from evaporation of a sample during measurement and therefore capable of quantifying a substrate using a very small amount of sample with high accuracy and which is free from scattering of the sample during and after the measurement and therefore hygienically excellent; and a measuring device and a substrate quantification method using the same. The analytical element comprises a cavity for accommodating a sample, a working electrode and a counter electrode exposed to an inside of the cavity, a reagent layer which comprises at least an oxidoreductase and is formed inside or in the vicinity of the cavity, an opening communicating with the cavity and a member covering the opening.
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