Polymer, chemically amplified resist composition and patterning process
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United States of America Patent
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Apr 12, 2005
Grant Date -
Jan 10, 2002
app pub date -
Apr 26, 2001
filing date -
Apr 27, 2000
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Abstract
Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F.sub.2 excimer laser light are obtained.
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