Method and apparatus for performing pattern defect repair using Q-switched mode-locked pulse laser
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United States of America Patent
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Apr 12, 2005
Grant Date -
Jan 24, 2002
app pub date -
Jul 24, 2001
filing date -
Jul 24, 2000
priority date (Note) -
Expired
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Abstract
A method for repairing a pattern by using a laser and a laser-based pattern repair apparatus are provided which are capable of reducing splashes, rolling-up, and damage to a glass substrate to a minimum in pattern defects repairing processing by removing a thin metal layer such as a chromium layer. A part of a string of pulses obtained by slicing, using an optical shutter, pulses from laser light having a pulse width of 10 ps to 300 ps emitted from a Q-switched mode-locked pulse laser is used to produce multi-pulses which are divided into two portions in terms of time base correction using an optical delaying unit.
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