Design driven inspection or measurement for semiconductor using recipe
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United States of America Patent
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Apr 26, 2005
Grant Date -
N/A
app pub date -
Dec 21, 2001
filing date -
Dec 21, 2001
priority date (Note) -
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Abstract
Design driven inspection/metrology methods and apparatus are provided. A recipe is a set of instructions including wafer processing parameters, inspection parameters, or control parameters for telling an inspection/metrology system how to inspect/measure a wafer. Design data is imported into a recipe extraction system that recognizes instances of target structures and configures recipe parameters accordingly, thereby reducing manual instrument setup time, improving inspection/measurement accuracy, and improving fabrication efficiency.
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