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Abstract

A multi-exposure drawing apparatus for drawing a given pattern on a workpiece is provided. The apparatus uses an exposure unit with optical modulation elements arranged in a matrix. The apparatus comprises a first, second, and third memory, a coordinate transformation processor, a calculation processor, and an exposure-data generating processor. The first, second, and third memory respectively stores raster-data of the given pattern, first-coordinate data representing a position of each optical modulation element, and second-coordinate data representing a position of the exposure unit. The coordinate transformation is performed for the first-coordinate data. Address-data is calculated in accordance with a pixel size of the raster-data, and is based on the sum of the first and second coordinate data. Exposure-data generated by outputting the raster-data of the address-data is given to each of the optical modulation elements. The given pattern is drawn on the drawing surface as to the exposure-data.

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First Claim