Methods and systems for determining an implant characteristic and a presence of defects on a specimen
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United States of America Patent
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May 10, 2005
Grant Date -
Jul 18, 2002
app pub date -
Sep 20, 2001
filing date -
Sep 20, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, an implant characteristic and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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