Substrate treating apparatus
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United States of America Patent
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May 17, 2005
Grant Date -
Nov 20, 2003
app pub date -
Apr 16, 2003
filing date -
May 1, 2002
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate treating apparatus disclosed herein realizes improved throughput. The substrate treating apparatus according to this invention includes an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition. Each block includes chemical treating modules, heat-treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block. Transfer of the substrates between adjacent blocks is carried out through substrate rests. The main transport mechanism of each block is not affected by movement of the main transport mechanisms of the adjoining blocks. Consequently, the substrates may be transported efficiently to improve the throughput of the substrate treating apparatus.
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