Multi-port chemical dispense
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United States of America Patent
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May 17, 2005
Issued Date -
N/A
app pub date -
Dec 23, 1999
filing date -
Jun 5, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for applying conservative amounts of a fluid to coat a silicon wafer surface. The surface is rotated and the fluid is applied to the surface through multiple application ports. Centrifugal forces spread the fluid across the wafer surface.
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