Substrate processing apparatus and substrate processing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 17, 2005
Grant Date -
Apr 3, 2003
app pub date -
Sep 25, 2002
filing date -
Oct 3, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A substrate processing apparatus provided with: a coating processing section for supplying a coating solution to a substrate; a pressure processing section for pressurizing a coating film formed on the substrate; and a developing processing section for supplying a developing solution to the substrate having the coating film selectively exposed to light with the use of an exposure mask. The pressure processing section may be arranged such that a pressing plate having a flat face is brought into pressure contact with the coating film.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully