Process monitor
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United States of America Patent
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May 17, 2005
Grant Date -
N/A
app pub date -
Jul 12, 1999
filing date -
Jul 11, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A substrate is etched in a vacuum enclosure in a process which generates plasma light emission. The process is monitored by passing emitted light via a window, a thin film narrow band filter and a 'Fabry-Perot' etalon to a detector. The output signal from the detector is analyzed by shape recognition techniques to derive a measure of the progress of the process. The shape recognition preferably makes use of digital filtering and comparison with reference data derived from the theoretical analysis or from a calibration run.
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