Aperture masks for circuit fabrication
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United States of America Patent
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May 24, 2005
Grant Date -
Aug 14, 2003
app pub date -
Feb 14, 2002
filing date -
Feb 14, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Aperture masks and deposition techniques for using aperture masks are described. In addition, techniques for creating aperture masks and other techniques for using the aperture masks are described. The various techniques can be particularly useful in creating circuit elements for electronic displays and low-cost integrated circuits such as radio frequency identification (RFID) circuits. In addition, the techniques can be advantageous in the fabrication of integrated circuits incorporating organic semiconductors, which typically are not compatible with wet processes.
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