Method and apparatus for proper ordering of registration data
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United States of America Patent
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May 31, 2005
Grant Date -
Oct 7, 2004
app pub date -
Mar 5, 2004
filing date -
Jan 5, 2001
priority date (Note) -
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Abstract
A photomask or reticle including a unique set of alignment attributes at separate and distinguishable field points is put in the reticle plane of a photolithographic projection system. The reticle pattern is exposed onto a resist coated wafer or substrate and processed through the final few steps of the photolithographic process. The resulting array of alignment attributes are then measured using a standard optical overlay metrology tool. The overlay tool is driven by a set of software instructions. By comparing the resulting overlay data to the placement error encoded on the reticle it can determined if the data has been read or displayed in the correct order.
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