Method of manufacturing a device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 7, 2005
Grant Date -
Jan 29, 2004
app pub date -
Jul 25, 2002
filing date -
Jul 25, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of manufacturing a device includes activating a gas containing at least one of hydrogen and of nitrogen by a hollow cathode discharge and exposing a first surface of a first material to the activated gas, thereby generating at the first surface an enrichment of at least one of hydrogen and of nitrogen and applying a further treatment to the enriched surface.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully