Dual wavelength method of determining a relative position of a substrate and a template

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United States of America Patent

PATENT NO 6902853
APP PUB NO 20040209177A1
SERIAL NO

10843195

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template.

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Patent Owner(s)

Patent OwnerAddress
BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEMAUSTIN TX 78701

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bailey, Todd Fishkill, NY 31 1174
Choi, Byung J Round Rock, TX 35 1939
Colburn, Matthew Hopewell Junction, NY 17 990
Sreenivasan, Sidlgata V Austin, TX 214 5594

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