Pattern writing apparatus and pattern writing method
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United States of America Patent
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Jun 7, 2005
Grant Date -
Jan 6, 2005
app pub date -
Jul 26, 2004
filing date -
May 16, 2002
priority date (Note) -
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Abstract
A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which spatially modulates reflected light. Light from the micromirrors of the DMD are directed to irradiation regions (61) on the substrate, respectively. The irradiation regions (61) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions (61) is tilted relative to the main scanning direction, and a center-to-center distance (L1) along the sub-scanning direction between two adjacent irradiation regions (61) arranged in the main scanning direction is made equal to a pitch (P1) of writing cells (620) on the substrate with respect to the sub-scanning direction. ON/OFF control of light irradiation of each irradiation region is performed each time the irradiation regions 61 move a distance equal to twice a pitch (P2).
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