Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas
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United States of America Patent
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Jun 14, 2005
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N/A
app pub date -
Apr 18, 2000
filing date -
Apr 18, 2000
priority date (Note) -
Expired
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Abstract
Apparatus and process for the abatement of fluorine and fluorine-containing compounds from gases containing same, such as effluent gas streams from semiconductor manufacturing operations, wherein a fluorocompound abatement medium is injected into the fluorocompound-containing gas. The fluorocompound abatement medium comprises at least one of steam, methane and hydrogen, with the proviso that when the fluorocompound abatement medium contains methane and/or hydrogen, the injection of the fluorocompound abatement medium is conducted under non-combustion conditions.
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