Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 14, 2005
Grant Date -
N/A
app pub date -
Sep 20, 2002
filing date -
Sep 20, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and apparatus for determining the dynamic scanning distortion present in lithographic scanners. A special reticle pattern is exposed over the full field that is to be characterized. The wafer is then rotated 90 degrees and one or more exposures over the same field are made. Interlocking alignment structures on the resulting developed wafer are then measured and used to reconstruct the dynamic scanner distortion to within a translation, rotation, and scan skew. Alternative embodiments describe techniques for extracting the repeatable part of the dynamic scan error.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully