Method and apparatus for self-referenced dynamic step and scan intra-field lens distortion
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United States of America Patent
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Jun 14, 2005
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N/A
app pub date -
Sep 20, 2002
filing date -
Sep 20, 2001
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Abstract
A reticle consisting of a 2-dimensional array of standard overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic scanner. Next, the overlay targets are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is then fed into a software program that generates the lens contribution to the intra-field error map for the photolithographic projection scanning system.
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