Method for imprint lithography using an electric field
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United States of America Patent
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Jun 21, 2005
Grant Date -
Jan 15, 2004
app pub date -
Jul 11, 2002
filing date -
Jul 11, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves the use of a template that is formed of non-conductive and electrically conductive portions. The template is brought into close proximity to the activating light curable liquid on the substrate. An external electric field is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the activating light curable liquid to be attracted to the raised portions of the template. Activating light is applied to the curable liquid while an electric field is applied to the template to create a patterned layer on the substrate.
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