Method for fabricating microelectronic fabrication electrical test apparatus electrical probe tip having pointed tips
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United States of America Patent
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Jun 21, 2005
Grant Date -
Nov 13, 2003
app pub date -
May 9, 2002
filing date -
May 9, 2002
priority date (Note) -
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Abstract
A method for fabricating an electrical test apparatus electrical probe tip first provides a probe tip substrate having a topographic surface. A high density plasma chemical vapor deposition (HDP-CVD) deposited mandrel layer is then formed upon the topographic surface. It has a series of pointed tips formed over a series of topographic features within the topographic surface. Finally, a conductor probe tip layer is formed conformally upon the high density plasma chemical vapor deposition (HDP-CVD) deposited mandrel layer and replicating the series of pointed tips. Due to the series of pointed tips and the series of replicated pointed tips, a microelectronic fabrication when tested with the electrical test apparatus electrical probe tip is tested with enhanced accuracy.
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