High resolution overlay alignment systems for imprint lithography
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United States of America Patent
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Jul 19, 2005
Grant Date -
May 6, 2004
app pub date -
May 27, 2003
filing date -
Jul 16, 2000
priority date (Note) -
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Abstract
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
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