High-resolution overlay alignment methods for imprint lithography
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United States of America Patent
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Jul 26, 2005
Grant Date -
Jul 25, 2002
app pub date -
Jul 16, 2001
filing date -
Jul 16, 2000
priority date (Note) -
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Abstract
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
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