Apparatus and method for synthesizing films and coatings by focused particle beam deposition
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United States of America Patent
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Aug 2, 2005
Grant Date -
Mar 11, 2004
app pub date -
Jul 19, 2001
filing date -
Jul 19, 2000
priority date (Note) -
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Abstract
A particle beam deposition apparatus includes a particle source for generating a plurality of particles in suspended form, an expansion chamber, and a deposition chamber connected to the expansion chamber by an aerodynamic focusing stage, and containing a substrate. The aerodynamic focusing stage may be comprised of a plurality of aerodynamic focusing elements, or lenses. Particles, including nanoparticles, may be deposited on the substrate by generating an aerosol cloud of particles, accelerating the particles into the expansion chamber, creating a collimated beam out of the particles by passing them through the aerodynamic focusing lenses and into a deposition chamber, and impacting the particles into the substrate.
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