Developing photoresist with supercritical fluid and developer
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United States of America Patent
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Aug 2, 2005
Grant Date -
N/A
app pub date -
Feb 14, 2003
filing date -
Feb 15, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
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