US Patent No: 6,926,584

Number of patents in Portfolio can not be more than 2000

Dual mode hybrid control and method for CMP slurry

ALSO PUBLISHED AS: 20040072503

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Importance

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Abstract

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A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.HSIN-CHU9899

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Chao-Jung Yunghe, TW 6 4
Chen, Ping-Hsu Hsinchu, TW 15 62
Huang, Chien-Ling Hsin-Chu, TW 4 9
Lo, Jui-Cheng Hsin-Chu, TW 7 38
Lu, Chien-Kuo Hsichu, TW 2 2
Peng, Chin-Hsin Hsin-Chu, TW 7 16

Cited Art Landscape

Patent Info (Count) # Cites Year
 
AIR PRODUCTS AND CHEMICALS, INC. (1)
5,046,925 Gas piston liquid flow controller 7 1991
 
BOEHRINGER LABORATORIES, INC. (1)
4,767,417 Drainage device for collecting liquids from a body cavity 27 1986
 
ITT MANUFACTURING ENTERPRISES, INC. (1)
5,273,664 Apparatus and method for disinfection of water by ozone injection 30 1992
 
YANKEE INTERNATIONAL MEDICAL RESEARCH AND MANUFACTURING LIMITED, P.O. BOX 151, MANCHESTER, NEW HAMPSHIRE 03105-0151 (1)
4,966,691 Measurement and control of ultrafiltration in dialysis 18 1989

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
EBARA CORPORATION (1)
8,360,817 Polishing apparatus and polishing method 0 2010

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