Drying resist with a solvent bath and supercritical CO2
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United States of America Patent
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Aug 16, 2005
Grant Date -
Feb 26, 2004
app pub date -
Feb 14, 2003
filing date -
Feb 15, 2002
priority date (Note) -
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Abstract
A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the object. The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath. A drying process is performed.
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