Externally excited torroidal plasma source with magnetic control of ion distribution
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United States of America Patent
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-
Sep 6, 2005
Grant Date -
Dec 11, 2003
app pub date -
Jun 5, 2002
filing date -
Aug 11, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A plasma reactor is described that includes a vacuum chamber defined by an enclosure including a side wall and a workpiece support pedestal within the chamber defining a processing region overlying said pedestal. The chamber has at least a first pair of ports near opposing sides of said processing region and a first external reentrant tube is connected at respective ends thereof to the pair of ports. The reactor further includes a process gas injection apparatus (such as a gas distribution plate) and an RF power applicator coupled to the reentrant tube for applying plasma source power to process gases within the tube to produce a reentrant torroidal plasma current through the first tube and across said processing region. A magnet controls radial distribution of plasma ion density in the processing region, the magnet having an elongate pole piece defining a pole piece axis intersecting the processing region.
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