Apparatus for improved low pressure inductively coupled high density plasma reactor

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United States of America Patent

PATENT NO 6939813
SERIAL NO

10263624

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma reactor comprises an electromagnetic energy source coupled to a radiator through first and second variable impedance networks. The plasma reactor includes a chamber having a dielectric window that is proximate to the radiator. A shield is positioned between the radiator and the dielectric window. The shield substantially covers a surface of the radiator near the dielectric window. A portion of the radiator that is not covered by the shield is proximate to a conductive wall of the chamber. Plasma reactor operation includes the following steps. A plasma is ignited in a chamber with substantially capacitive electric energy coupled from the radiator. A variable impedance network is tuned so that the capacitive electric energy coupled into the chamber is diminished. The plasma is then powered with substantially magnetic energy.

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Patent Owner(s)

Patent OwnerAddress
MICRON TECHNOLOGY INCBOISE ID

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Blalock, Guy T Boise, ID 151 4037
Donohoe, Kevin G Boise, ID 117 2234

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