Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography

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United States of America Patent

PATENT NO 6954275
APP PUB NO 20020093122A1
SERIAL NO

09920341

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Abstract

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Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.

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Patent Owner(s)

  • BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bailey, Todd Austin, TX 28 1153
Choi, Byung J Round Rock, TX 35 1914
Colburn, Matthew Danbury, CT 17 981
Ekerdt, John Austin, TX 10 623
Sreenivasan, S V Austin, TX 15 680
Willson, C Grant Austin, TX 38 981

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