Concentric proximity processing head
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United States of America Patent
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Oct 18, 2005
Issued Date -
N/A
app pub date -
Jun 30, 2004
filing date -
Sep 30, 2002
priority date (Note) -
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status (Latency Note)
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Abstract
In one of the many embodiments, a method for processing a substrate is disclosed which includes generating a first fluid meniscus and a second fluid meniscus at least partially surrounding the first fluid meniscus wherein the first fluid meniscus and the second fluid meniscus are generated on a surface of the substrate.
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