Semiconductor-processing reaction chamber

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United States of America Patent

PATENT NO 6955741
APP PUB NO 20040026041A1
SERIAL NO

10214890

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Abstract

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The present application provides a PECVD reaction chamber for processing semiconductor wafers comprising a susceptor for supporting a semiconductor wafer inside the reaction chamber wherein the susceptor comprises a plurality vertical through-bores, a moving means for moving the susceptor vertically between at least a first position and a second position, wafer-lift pins passing through the through-bores wherein the lower end of each wafer pin is attached to a lift member, and a lift member linked with an elevating mechanism for moving the wafer-lift pins vertically. The disclosed apparatus reduces contamination on the underside of the semiconductor wafer.

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Patent Owner(s)

Patent OwnerAddress
ASM JAPAN K K23-1 6-CHOME NAGAYAMA TAMA-SHI TOKYO 206-0025

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yamagishi, Takayuki Tokyo, JP 44 12765

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