Apertured probes for localized measurements of a material's complex permittivity and fabrication method
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United States of America Patent
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Nov 1, 2005
Grant Date -
Aug 21, 2003
app pub date -
Mar 21, 2003
filing date -
Sep 20, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A probe for non-destructive determination of complex permittivity of a material and for near field optical microscopy is based on a balanced multi-conductor transmission line structure created on a dielectric substrate member which confines the probing field within a sharply defined sampling volume in the material under study. A method for manufacturing dielectric support member based probes includes anisotropically depositing a 50-100 .ANG. thick underlayer of Cr, Ni, W or Ta onto the dielectric support member, anisotropically depositing conductive material onto the Cr, Ni, W or Ta underlayer, and removing the unwanted conductive material at the sides of the dielectric support member to electrically isolate the created conductive strips.
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