Method for production of a metallic or metal-containing layer
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United States of America Patent
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Nov 1, 2005
Issued Date -
N/A
app pub date -
Oct 21, 2003
filing date -
Apr 30, 2001
priority date (Note) -
Expired
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Abstract
The invention relates to a method for production of a metallic or metal-containing layer (5) by using a pre-cursor on a silicon- or germanium-containing layer, of, in particular, an electronic component, whereby an intermediate layer is applied to the silicon- or germanium-containing layer before the use of the pre-cursor. Said intermediate layer forms a diffusion barrier for at least those elements or the pre-cursor which would etch the silicon- or germanium-containing layer and is itself resistant to etching by the pre-cursor.
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