Lithographic apparatus device manufacturing method and device manufactured thereby

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United States of America Patent

PATENT NO 6967756
APP PUB NO 20040202898A1
SERIAL NO

10834834

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Abstract

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A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Franken, Dominicus Jacobus Petrus Adrianus Veldhoven, NL 28 276
Loopstra, Erik Roelof Heeze, NL 325 13468
Van, Dijsseldonk Antonius Johannes Josephus Hapert, NL 30 438

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