Rotating surface of revolution reactor with shearing mechanisms
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United States of America Patent
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-
Dec 20, 2005
Grant Date -
N/A
app pub date -
Feb 17, 2000
filing date -
Feb 17, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A reactor including a rotatable disc (3) having a surface (5) onto which reactant (15) is supplied by way of a feed (4). The disc (3) is rotated at high speed, and the reactant (15) spills over the surface (5) so as to form a film (17). A shear member (18, 20) is mounted close to the surface (5) so as to contact the film (17) during operation of the reactor, thereby applying a shearing force to the reactant (15) so as to aid mixing.
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