Optical exposure apparatus and method for aligning a substrate
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United States of America Patent
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Jan 24, 2006
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N/A
app pub date -
Jan 24, 2005
filing date -
Jul 12, 2002
priority date (Note) -
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Abstract
A system for processing a multilayer liquid crystal film display material, with multiple irradiation apparatus (60) for applying a zone of polarized UV irradiation onto a substrate fed from a web (16) with incident light at a desired angle. Each irradiation apparatus (60) includes a UV light source (64), and one or more optional filters (82). A polarizer (90) is provided, sized and arranged to polarize light over the web (16) as it moves. The irradiation apparatus (60) employs an array of louvers (81) and/or a prism array (72). One irradiation apparatus (60) irradiates a first LPP1 layer (22) at a 0-degree alignment, in the web movement direction, the other irradiation apparatus (60) irradiates an LPP2 layer (26) with an orthogonal 90-degree alignment.
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