Lithographic projection apparatus and device manufacturing method
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United States of America Patent
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Feb 7, 2006
Grant Date -
Jun 23, 2005
app pub date -
Dec 22, 2003
filing date -
Dec 22, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation reflected therefrom using each one of a first array of focusing elements. An image of the first array of focusing elements is projected onto a second array of focusing elements using a projection system, such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements and the projection system to one of the focusing elements in the second array which focuses the radiation onto a spot on the substrate.
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