Developing method, substrate treating method, and substrate treating apparatus
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United States of America Patent
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Feb 21, 2006
Grant Date -
Apr 14, 2005
app pub date -
Oct 21, 2004
filing date -
Aug 30, 2002
priority date (Note) -
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Abstract
A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.
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