Chemical mechanical polishing and pad dressing method

United States of America Patent

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Feb 28, 2006
Grant Date
Feb 5, 2004
app pub date
Feb 28, 2003
filing date
Jul 31, 2002

priority date (Note)
Expired

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Abstract

The invention provides a chemical mechanical polishing and pad dressing method based on differing the rotational of a pad dresser, head, and/or polishing pad to improve center removal slow profiling.

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Patent Owner(s)

Patent Owner	Address
EBARA TECHNOLOGIES INCORPORATED	51 MAIN AVENUE SACRAMENTO CA 95838

International Classification(s)

B24B:MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR PO....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Lao, Peter	San Jose, CA	4	35
Moloney, Gerard Stephen	Milpitas, CA	3	30
Wang, Huey-Ming	Fremont, CA	23	426

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Chemical mechanical polishing and pad dressing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10378024

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PATENT NO	7004822
APP PUB NO	20040023602A1
SERIAL NO	10378024
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 28, 2006	US,7004822,B2 US7004822B2	GRANTED PATENT AS SECOND PUBLICATION
February 05, 2004	US,20040023602,A1 US20040023602A1	FIRST PUBLISHED PATENT APPLICATION

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10378024

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